Development of positive photoresistsMACK, C. A.Journal of the Electrochemical Society. 1987, Vol 134, Num 1, pp 148-152, issn 0013-4651Article

New kinetic model for resist dissolutionMACK, C. A.Journal of the Electrochemical Society. 1992, Vol 139, Num 4, pp L35-L37, issn 0013-4651Article

Comprehensive simulation of e-beam lithography processes using PROLITH/3D and TEMPTATION software toolsKUZMIN, I. Yu; MACK, C. A.SPIE proceedings series. 2001, pp 503-507, isbn 0-8194-3849-9Conference Paper

Focal angiogen therapy using intramyocardial delivery of an adenovirus vector coding for vascular endothelial growth factor 121. CommentaryLEE, L. Y; PATEL, S. R; ISOM, O. W et al.The Annals of thoracic surgery. 2000, Vol 69, Num 1, pp 14-24, issn 0003-4975Conference Paper

Electron beam lithography simulation for mask makingMACK, C. A.Microelectronic engineering. 1999, Vol 46, Num 1-4, pp 283-286, issn 0167-9317Conference Paper

Design and analysis of manufacturable alternating phase-shifting masksGORDON, R. L; MACK, C. A; PETERSEN, J. S et al.SPIE proceedings series. 1998, pp 606-616, isbn 0-8194-3007-2Conference Paper

Analysing the dissolution characteristics of deep uv chemically amplified photoresistARTHUR, G; MACK, C. A; EILBECK, N et al.Microelectronic engineering. 1998, Vol 41-42, pp 311-314, issn 0167-9317Conference Paper

Primary inflammatory fibrosarcoma of the esophagusMAGOVERN, C. J; MACK, C. A; GU, M et al.The Annals of thoracic surgery. 1996, Vol 62, Num 6, pp 1848-1850, issn 0003-4975Article

Modeling and characterization of a 0.5 μm deep ultraviolet processMACK, C. A; CAPSUTO, E; SETHI, S et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1991, Vol 9, Num 6, pp 3143-3149, issn 0734-211XConference Paper

Uses of Sorghum Graim in Gluten-Free ProductsASIF, M; ROONEY, L. W; ACOSTA-SANCHEZ, D et al.Cereal foods world. 2010, Vol 55, Num 6, pp 285-291, issn 0146-6283, 7 p.Article

Electron beam lithography simulation for mask making, Part IMACK, C. A.SPIE proceedings series. 1998, pp 216-227, isbn 0-8194-2669-5Conference Paper

Enhancing the development rate model for optimum simulation capability in the sub-half-micron regimeARTHUR, G; MARTIN, B; MACK, C. A et al.SPIE proceedings series. 1997, pp 189-200, isbn 0-8194-2463-3Conference Paper

Resolution and depth of focus in optical lithographyMACK, C. A.SPIE proceedings series. 1997, pp 14-27, isbn 0-8194-2610-5Conference Paper

Direct in vivo gene transfer to canine myocardium using a replication-deficient adenovirus vector. DiscussionMAGOVERN, C. J; MACK, C. A; ZHANG, J et al.The Annals of thoracic surgery. 1996, Vol 62, Num 2, pp 425-434, issn 0003-4975Conference Paper

Reducing proximity effects in optical lithographyMACK, C. A.Japanese journal of applied physics. 1996, Vol 35, Num 12B, pp 6379-6385, issn 0021-4922, 1Conference Paper

A technique for laparoscopic repair of herniation of the anterior abdominal wall using a composite mesh prosthesisBARIE, P. S; MACK, C. A; THOMPSON, W. A et al.The American journal of surgery. 1995, Vol 170, Num 1, pp 62-63, issn 0002-9610Article

Lithography simulation employing rigorous solutions to Maxwell's equationsGORDON, R; MACK, C. A.SPIE proceedings series. 1998, pp 176-196, isbn 0-8194-2779-9Conference Paper

Therapeutic angiogenesis : A comparative study of the angiogenic potential of acidic fibroblast growth factor and heparinROSENGART, T. K; BUDENBENDER, K. T; DUENAS, M et al.Journal of vascular surgery. 1997, Vol 26, Num 2, pp 302-312, issn 0741-5214Article

Channel patency and neovascularization after transmyocardial revascularization using an excimer laser : Results and comparisons to nonlased channelsMACK, C. A; MAGOVERN, C. J; HAHN, R. T et al.Circulation (New York, N.Y.). 1997, Vol 96, Num 9, pp II-65, issn 0009-7322, -II-69, SUPConference Paper

Clinical and hemodynamic performance of the 19-mm Carpentier-Edwards porcine bioprosthesisBOJAR, R. M; RASTEGAR, H; PAYNE, D. D et al.The Annals of thoracic surgery. 1993, Vol 56, Num 5, pp 1141-1147, issn 0003-4975Article

Generalized approach toward modeling resist performanceZIGER, D. H; MACK, C. A.AIChE journal. 1991, Vol 37, Num 12, pp 1863-1874, issn 0001-1541Article

Myogenic vasoregulation overrides local metabolic control in resting rat skeletal muscleMEININGER, G. A; MACK, C. A; FEHR, K. L et al.Circulation research. 1987, Vol 60, Num 6, pp 861-870, issn 0009-7330Article

Assessment of a hypothetical roadmap that extends optical lithography through the 70nm technology nodePETERSEN, J. S; MCCALLUM, M; KACHWALA, N et al.SPIE proceedings series. 1999, pp 73-89, isbn 0-8194-3221-0Conference Paper

Mask topography simulation for EUV lithographyGORDON, R. L; MACK, C. A.SPIE proceedings series. 1999, isbn 0-8194-3150-8, 2Vol, Vol 1, 283-297Conference Paper

Effect of developer temperature and normality on conventional and chemically amplified photoresist dissolutionMACK, C. A; MASLOW, M. J; BYERS, J et al.SPIE proceedings series. 1999, pp 148-160, isbn 0-8194-3221-0Conference Paper